Total Ionising Dose Effects on HFO2 and AL2O3 Gate Oxide SOI FinFET
Date of Submission
21st Nov 2024
General Information:
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Year Of Paper Submission : 2018-19 |
Type of Applicant : Faculty |
Selected Course : PhD |
Department of Applicant : EXTC |
Class of Applicant : Faculty |
Applicants Details:
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Applicant Name : Reena Sonkusare |
Guide Details:
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Paper Details:
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Title of Paper : Total Ionising Dose Effects on HFO2 and AL2O3 Gate Oxide SOI FinFET |
Type of Paper : Conference |
Type of Publication : International |
Date Of Conference / Journal / Book :
2000-01-01 |
Conference_Type : IEEE |
ISBN : 2289-2293 ISSN: 2320-2882 |